EOC's coating technology is based on "Ion Assisted Deposition (IAD)". It is a kind of physical vapor deposition method but with ion beam attached. This technical can device enhances thin film adhesion and quality. Additionally, the packing density of our thin films can be increased by the injection of highly energetic ions from carefully controlled ion sources. The electron beam evaporators and ion sources can be done independently which allow us easily adjusting suitable process parameters. For example, depositing low-absorption and stress-free films.
The unparalleled production reliability and application specific film properties are the result of our expert use of ion-assisted deposition.
- NBPF Coaters x12
- OTFC Coater x3